Handbook of sputter deposition technology [recurso electrónico] : fundamentals and applications for functional thin films, nano-materials and MEMS / Hideaki Adachi...[et al.] ; edited by Kiyotaka Wasa, Isaku Kanno, Hidetoshi Kotera.
Tipo de material:
TextoDetalles de publicación: Waltham, MA : William Andrew, c2012Edición: 2nd edDescripción: 1 online resourceTema(s): Cathode sputtering (Plating process) -- Handbooks, manuals, etc | Thin films -- Handbooks, manuals, etc | Cathode sputtering (Plating process) | Thin filmsGénero/Forma: Electronic books. | Handbooks, manuals, etc.Clasificación CDD: 671.7/38 Clasificación LoC:TS695 | .H36 2012Recursos en línea: Libro electrónico ScienceDirect
Resumen: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.
| Tipo de ítem | Biblioteca actual | Colección | Signatura | Copia número | Estado | Fecha de vencimiento | Código de barras |
|---|---|---|---|---|---|---|---|
| Libro Electrónico | Biblioteca Electrónica | Colección de Libros Electrónicos | TS695 .H36 2012 (Browse shelf(Abre debajo)) | 1 | No para préstamo | 380494-2001 |
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.
Description based on title from publisher's website; (ScienceDirect; viewed on Oct. 25, 2012).
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