| 000 | 03415cam a2200565Ki 4500 | ||
|---|---|---|---|
| 001 | u380159 | ||
| 003 | SIRSI | ||
| 005 | 20160812084633.0 | ||
| 006 | m o d | ||
| 007 | cr cnu---unuuu | ||
| 008 | 131112s2011 nyu o 000 0 eng d | ||
| 040 |
_aOPELS _beng _erda _epn _cOPELS _dNT _dYDXCP _dUIU _dIDEBK _dMHW _dEBLCP |
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| 019 |
_a863039988 _a863158166 _a863203964 |
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| 020 | _a9780080947716 (electronic bk.) | ||
| 020 | _a0080947719 (electronic bk.) | ||
| 020 | _z9780815515937 | ||
| 020 | _z0815515936 | ||
| 020 | _a9780815519874 (electronic bk.) | ||
| 020 | _a0815519877 (electronic bk.) | ||
| 020 | _a1306119952 (ebk) | ||
| 020 | _a9781306119955 (ebk) | ||
| 029 | 1 |
_aNLGGC _b370307356 |
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| 029 | 1 |
_aNZ1 _b15295455 |
|
| 029 | 1 |
_aDEBSZ _b405351887 |
|
| 050 | 4 | _aTK7874 | |
| 082 | 0 | 4 |
_a621.381 _222 |
| 049 | _aTEFA | ||
| 100 | 1 |
_aSarkar, Jaydeep, _eauthor. |
|
| 245 | 1 | 0 |
_aSputtering materials for VLSI and thin film devices _h[recurso electrónico] / _cJaydeep Sarkar. |
| 264 | 1 |
_aNorwich, N.Y. : _bWilliam Andrew, _c2011. |
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| 264 | 2 |
_aOxford : _bElsevier Science [distributor] |
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| 300 | _a1 online resource | ||
| 336 |
_atext _btxt _2rdacontent |
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| 337 |
_acomputer _bc _2rdamedia |
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| 338 |
_aonline resource _bcr _2rdacarrier |
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| 520 | _aAn important resource for the microelectronics and flat panel display industries, this book focuses on the development of sputtering targets for conductor, diffusion barrier, reflective, data storage and display applications. Sarkar reviews essential microelectronics industry topics, including: history and technology trends; chip making fundamentals; deposition and properties of thin films; and the role of sputtering target performance on overall production yield. Materials science fundamentals, types of metallic materials for conductors, diffusion barrier, data storage, and flat panel display applications are also discussed. The author illustrates his arguments with case studies and real-world examples of troubleshooting in an industrial setting. Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirementsPractical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc.Practical case-studies on target performance and troubleshooting. Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry. | ||
| 588 | _aDescription based on print version record. | ||
| 650 | 0 |
_aMicroelectronics _xMaterials. |
|
| 650 | 0 |
_aFlat panel displays _xMaterials. |
|
| 650 | 0 | _aSputtering (Physics) | |
| 650 | 7 |
_aTECHNOLOGY & ENGINEERING / Mechanical _2bisacsh |
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| 655 | 4 | _aElectronic books. | |
| 655 | 7 |
_aElectronic books. _2local |
|
| 776 | 0 | 8 |
_iPrint version: _aSarkar, Jaydeep. _tSputtering materials for VLSI and thin film devices _z9780815515937 _w(OCoLC)660539201 |
| 856 | 4 | 0 |
_zLibro electrónico _3ScienceDirect _uhttp://148.231.10.114:2048/login?url=http://www.sciencedirect.com/science/book/9780815515937 |
| 596 | _a19 | ||
| 942 | _cLIBRO_ELEC | ||
| 999 |
_c207080 _d207080 |
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