Sputtering materials for VLSI and thin film devices [recurso electrónico] / Jaydeep Sarkar.

Por: Sarkar, Jaydeep [author.]Tipo de material: TextoTextoEditor: Norwich, N.Y. : William Andrew, 2011Distribuidor: Oxford : Elsevier Science [distributor] Descripción: 1 online resourceTipo de contenido: text Tipo de medio: computer Tipo de portador: online resourceISBN: 9780080947716 (electronic bk.); 0080947719 (electronic bk.); 9780815519874 (electronic bk.); 0815519877 (electronic bk.); 1306119952 (ebk); 9781306119955 (ebk)Tema(s): Microelectronics -- Materials | Flat panel displays -- Materials | Sputtering (Physics) | TECHNOLOGY & ENGINEERING / MechanicalGénero/Forma: Electronic books. | Electronic books.Formatos físicos adicionales: Print version:: Sputtering materials for VLSI and thin film devicesClasificación CDD: 621.381 Clasificación LoC:TK7874Recursos en línea: Libro electrónico ScienceDirectTexto Resumen: An important resource for the microelectronics and flat panel display industries, this book focuses on the development of sputtering targets for conductor, diffusion barrier, reflective, data storage and display applications. Sarkar reviews essential microelectronics industry topics, including: history and technology trends; chip making fundamentals; deposition and properties of thin films; and the role of sputtering target performance on overall production yield. Materials science fundamentals, types of metallic materials for conductors, diffusion barrier, data storage, and flat panel display applications are also discussed. The author illustrates his arguments with case studies and real-world examples of troubleshooting in an industrial setting. Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirementsPractical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc.Practical case-studies on target performance and troubleshooting. Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry.
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Existencias
Tipo de ítem Biblioteca actual Colección Signatura Copia número Estado Fecha de vencimiento Código de barras
Libro Electrónico Biblioteca Electrónica
Colección de Libros Electrónicos TK7874 (Browse shelf(Abre debajo)) 1 No para préstamo 380159-2001

An important resource for the microelectronics and flat panel display industries, this book focuses on the development of sputtering targets for conductor, diffusion barrier, reflective, data storage and display applications. Sarkar reviews essential microelectronics industry topics, including: history and technology trends; chip making fundamentals; deposition and properties of thin films; and the role of sputtering target performance on overall production yield. Materials science fundamentals, types of metallic materials for conductors, diffusion barrier, data storage, and flat panel display applications are also discussed. The author illustrates his arguments with case studies and real-world examples of troubleshooting in an industrial setting. Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirementsPractical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc.Practical case-studies on target performance and troubleshooting. Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry.

Description based on print version record.

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